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View
| 2-photon writer | PA01 | Additive manufacturing | Milena Moreira | C | UpNano | Up250 |
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View
| 3D Optical Profiler ZYGO | AU07 | Surface analysis | Amit Patel | A | ZYGO | NexView |
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View
| AFM - PSIA XE150 | AU04 | Surface analysis | Amit Patel | B | PSIA | XE150 |
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View
| ALD | PT17 | Thin film deposition | Zhibin Zhang | C | Picosun | R200 |
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View
| ALD - F120 | PT15 | Thin film deposition | Tobias Törndahl | C | Microchemistry | F120 |
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View
| ALD - inSE | PT21 | Thin film deposition | Carl Hägglund | B | Picosun / Woollam | P R200 / W RC2 |
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View
| ALD - MP3 | PT19 | Thin film deposition | Tobias Törndahl | C | - | - |
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View
| Balance | AP32 | Sample preparation | Amit Patel | A | Mettler | Toledo |
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View
| Balance | PM19 | Metrology | Milena Moreira | A | Denver Instrument | XL410D |
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View
| Balance | PM20 | Metrology | Milena Moreira | A | Sartorus | BP4100 |
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View
| Beamer computer | PL41 | Lithography | Örjan Vallin | A | Dell | Precision 3460 |
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View
| CIGS evaporator - BAK | PT10 | Thin film deposition | Marika Edoff | C | Baltzers | BAK 550 |
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View
| Diamond polishing | AT17 | Transmission electron microscopy (TEM) | Amit Patel | A | Struers | DAP V |
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View
| Dicing Saw | PB01 | Backend process | Milena Moreira | B | Disco | DAD 361 |
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View
| Dimple Grinder | AT07 | Transmission electron microscopy (TEM) | Amit Patel | A | Gatan | 656 |
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View
| Dip Coater | PC44 | Wet process & preparation | Hugo Nguyen | A | Bungard | RDC 21 |
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View
| E-beam/resisitive evaporator - BA | PT14 | Thin film deposition | Adam Hultqvist | B | Baltzers | BA |
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View
| EBL (e-beam litho) - JEOL | PL40 | Lithography | Örjan Vallin | D | JEOL Ltd. | JBX-8100FS |
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View
| EBL (e-beam litho) - NBL | PL37 | Lithography | Örjan Vallin | D | NanoBeam Ltd. | nB5 |
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View
| Ellipsometer "Rudolph" | PM12 | Metrology | Tomas Nyberg | B | Rudolph Research | --- |
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View
| Embedder | AP03 | Sample preparation | Amit Patel | B | Buehler | Simplimet |
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View
| ESCA II | AX02 | Chemical analysis | Amit Patel | C | Physical Electronics | Quantera II |
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View
| Evaporator - cryo (restricted use) | PT08 | Thin film deposition | Tomas Nyberg | C | Kurt J. Lesker Company | PVD 75 |
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View
| Evaporator - TMP (general use) | PT07 | Thin film deposition | Tomas Nyberg | C | Kurt J. Lesker Company | PVD 75 |
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View
| Evaporator - UMS | PT11 | Thin film deposition | Adam Hultqvist | C | Baltzers | UMS |
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View
| Evaporator (C) | AP17 | Sample preparation | Amit Patel | B | Polaron | --- |
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View
| Extruder | PA03 | Additive manufacturing | Milena Moreira | B | Thermo Scientific | Process 11 Parallel Twin-screw Extruder |
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View
| FIB/SEM - Crossbeam | AF02 | Focused ion beam (FIB) | Fredric Ericson | D | Zeiss | Zeiss Crossbeam 550 |
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View
| Four Point Probe | PM35 | Metrology | Tomas Nyberg | A | Ossila | T2001A3 |
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View
| Four Point Probe - automatic | PM21 | Metrology | Tomas Nyberg | A | AIT | CMT-SR2000N |
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View
| Fume hood – acids | FC09 | Wet process & preparation | Sven Norén | A | - | - |
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View
| Fume Hood - CBD | PC48 | Wet process & preparation | Jonathan Scragg | A | --- | --- |
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View
| Fume Hood – KCN | PC51 | Wet process & preparation | Jonathan Scragg | A | - | - |
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View
| Fume hood – solvents | FC06 | Wet process & preparation | Sven Norén | A | - | - |
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View
| Furnace | AT15 | Transmission electron microscopy (TEM) | Amit Patel | A | Heraeus | --- |
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View
| GDOES | AX04 | Chemical analysis | Jan Keller | B | Spectruma | GDA 750 HR |
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View
| Glass substrate cleaner | PC52 | Wet process & preparation | Adam Hultqvist | A | Semitool | - |
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View
| Hot Plate | AT13 | Transmission electron microscopy (TEM) | Amit Patel | A | Heidolph | MR3003 |
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View
| Hot Plate | AP31 | Sample preparation | Amit Patel | A | Heidolph | MR3003 |
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View
| Hot Plate | PL11 | Lithography | Rimantas Brucas | A | Süss MicroTec | HP8 BM |
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View
| Hot Plate | PL12 | Lithography | Rimantas Brucas | A | Süss MicroTec | HP8 BM |
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View
| Hot Plate | PL13 | Lithography | Rimantas Brucas | A | BLE | --- |
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View
| HT Furnace - atm | PD17 | Thermal process | Hugo Nguyen | A | Thermolyne | --- |
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View
| Hydraulic Press (w. heater) | PB08 | Backend process | Hugo Nguyen | A | Bungard | RMP 210 |
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View
| ICP-RIE (Si-DRIE / aluminum etch) | PE01 | Dry etch | Örjan Vallin | D | PlasmaTherm | SLR with two 770 ICP chambers |
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View
| ICP-RIE (Si-DRIE) "Tegal" | PE07 | Dry etch | Örjan Vallin | D | Tegal | 110 S/DE |
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View
| Image Reversal / Vapor Prime Furnace | PL36 | Lithography | Rimantas Brucas | A | Yield Engineering Systems | YES-58TA-E |
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View
| Ink Jet Printer | PB13 | Backend process | Zhibin Zhang | B | Fuji Film | Dimatix 2831 |
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View
| Ion Beam Etcher | PE10 | Dry etch | Björn Kuzavas | A | MSL-LK | Mark 1 |
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View
| Ion Beam Etcher | PE11 | Dry etch | Örjan Vallin | B | Scientific Vacuum Systems | i6000 Milling System |
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View
| Ion mill PIPS | AT19 | Transmission electron microscopy (TEM) | Amit Patel | A | Gatan | PIPS |
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View
| Ion Mill PIPS | AT08 | Transmission electron microscopy (TEM) | Amit Patel | A | Gatan | PIPS model 691 |
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View
| Ion Polisher Ilion | AP34 | Sample preparation | Fredric Ericson | A | Gatan | llion II |
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View
| IR camera | PM18 | Metrology | Örjan Vallin | A | Hamamatsu | C2742 |
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View
| Laser cutter | PB17 | Backend process | Hugo Nguyen | C | Östling | AIO G+ 532 nm 5 W |
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View
| LOM - Leica DVM6 - Optical Microscope | AU08 | Surface analysis | Amit Patel | A | Leica Microsystems | DVM6 |
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View
| LOM - Olympus - Optical Microscope | AU03 | Surface analysis | Amit Patel | A | Olympus | AX70 |
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View
| Mask Aligner - front / back side align | PL03 | Lithography | Rimantas Brucas | C | Karl Süss | MA6 / BA6 |
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View
| Mask Aligner - front side align | PL04 | Lithography | Rimantas Brucas | C | Karl Süss | MA6 |
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View
| Measuring Microscope with Digital Readout | PM24 | Metrology | Örjan Vallin | A | Nikon/Metronics | MM-40/Quadra Chek 200 |
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View
| Mo sputter - MRC II | PT13 | Thin film deposition | Adam Hultqvist | B | MRC | --- |
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View
| Nanoimprinter | PL30 | Lithography | Rimantas Brucas | D | Obducat | NIL-6 |
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View
| Nanoindenter | AU06 | Surface analysis | Urban Wiklund | A | CSM | UNHT |
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View
| Optical Microscope | PL35 | Metrology | Örjan Vallin | A | Nikon | Eclips L200ND |
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View
| Optical Microscope | PM01 | Metrology | Rimantas Brucas | A | Leitz | Ergolux |
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View
| Optical Microscope | PM02 | Metrology | Fredric Ericson | A | Leitz | --- |
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View
| Optical Microscope | PM03 | Metrology | Rimantas Brucas | A | Olympus | --- |
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View
| Optical Microscope | PM17 | Metrology | Örjan Vallin | B | Nikon | Eclipse ME600 |
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View
| Optical microscope | PL39 | Lithography | Rimantas Brucas | A | Olympus | MX63 |
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View
| Parylene Coater | PD16 | Thermal process | Milena Moreira | A | Paratech | Lab Top 3000 |
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View
| PC12 - wet bench - Stangl | PC12 | Wet process & preparation | Sven Norén | B | - | - |
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View
| PCB plotter | PB18 | Backend process | Hugo Nguyen | B | LPKF | S104 |
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View
| Penta head 3D printer | PA02 | Additive manufacturing | Milena Moreira | C | nScrypt | 3Dn-300 |
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View
| Pick-&-Place (w. dispenser) | PB06 | Backend process | Hugo Nguyen | A | LPKF | ProtoPlace S |
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View
| PL / EL Quantum Yield | PM34 | Metrology | Jonathan Scragg | A | Edinburgh Instruments | FLS 1000 custom |
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View
| Plasma Cleaner | AT09 | Transmission electron microscopy (TEM) | Amit Patel | A | Fischione | --- |
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View
| Plasma Etcher | PE08 | Dry etch | Björn Kuzavas | A | Plasma Etch | PE-100 |
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View
| Plasmastripper "New Lower" | PE12 | Dry etch | Örjan Vallin | A | Tepla | 300 |
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View
| Plasmastripper "Upper" | PE04 | Dry etch | Örjan Vallin | B | Tepla | 300 |
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View
| Plating Station - pulse (Cu) | PC42 | Wet process & preparation | Sven Norén | A | LPKF | MiniContac-RS |
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View
| Polisher | AT16 | Transmission electron microscopy (TEM) | Amit Patel | A | Buehler | Ecomet 3 |
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View
| Polisher | AT05 | Transmission electron microscopy (TEM) | Amit Patel | A | Struers | DAP-V |
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View
| Polisher | AP06 | Sample preparation | Amit Patel | B | Buehler | Metaserv |
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View
| Polisher | AP07 | Sample preparation | Amit Patel | B | Buehler | Phoenix |
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View
| Resist Furnace | PL18 | Lithography | Rimantas Brucas | A | Heraeus | --- |
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View
| Resist Furnace | PB12 | Backend process | Hugo Nguyen | A | Binder | --- |
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View
| Resist Furnace (110 C) | PL16 | Lithography | Rimantas Brucas | A | Memmert | --- |
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View
| Resist Furnace (90 C) | PL15 | Lithography | Rimantas Brucas | A | Memmert | --- |
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View
| Resist Laminator | PB10 | Backend process | Milena Moreira | A | Bungard | RLM 419 p |
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View
| Resist Laminator | PB16 | Backend process | Hugo Nguyen | A | MEGA Electronics | 305 |
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View
| Resist spinner | PL38 | Lithography | Örjan Vallin | A | Polos | SPIN 150i |
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View
| RIE (SiO / SiN) | PE06 | Dry etch | Örjan Vallin | C | Advanced Vacuum | Vision 320 |
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View
| RTP | PD15 | Thermal process | Yao Yao | B | MPTC | RTP-600S |
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View
| Saw | AP02 | Sample preparation | Amit Patel | B | Buehler | Isomet |
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View
| Saw - low speed | AP01 | Sample preparation | Amit Patel | B | Buehler | Isomet |
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View
| Screen Printer | PB07 | Backend process | Hugo Nguyen | A | LPKF | ProtoPrint S |
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View
| Scriber | PB14 | Backend process | Jan Keller | B | Bosch | --- |
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View
| SEM/EDS - 1530 | AS06 | Scanning electron Microscopy (SEM) | Amit Patel | C | Carl Zeiss | SEM |
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View
| SEM/EDS - 1550 | AS02 | Scanning electron Microscopy (SEM) | Amit Patel | C | Zeiss | LEO1550 |
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View
| SEM/EDS/EBSD - Merlin | AS05 | Scanning electron Microscopy (SEM) | Fredric Ericson | C | Zeiss | Merlin |
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View
| Solder Furnace | PB09 | Backend process | Hugo Nguyen | A | LPKF | ProtoFlow S |
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View
| Spectroscopic ellipsometer | PM33 | Metrology | Carl Hägglund | C | Woollam | RC2-XI |
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View
| Spectroscopic reflectometer "K-MAC" | PM31 | Metrology | Örjan Vallin | A | K-MAC | ST4000-DLX |
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View
| Spin Coater | PL08 | Lithography | Rimantas Brucas | B | Süss MicroTec | LabSpin6 |
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View
| Spin Coater | PL10 | Lithography | Rimantas Brucas | B | BLE | Delta 10 |
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View
| Spin-Rinse-Dryer | PC47 | Wet process & preparation | Adam Hultqvist | A | --- | --- |
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View
| Spin-Rinse-Dryer | PC53 | Wet process & preparation | Örjan Vallin | A | Semitool | 470S with 102 controller |
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View
| Spin-Spray Coater | PL31 | Lithography | Rimantas Brucas | B | EVG | 101 |
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View
| Spray Etcher | PC45 | Wet process & preparation | Hugo Nguyen | A | Solectro | --- |
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View
| Sputter - DC / RF | PT23 | Thin film deposition | Björn Kuzavas | A | FHR | --- |
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View
| Sputter - magnetron "Lesker" | PT09 | Thin film deposition | Tomas Kubart | D | Kurt J. Lesker Company | CMS-18 |
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View
| Sputter - magnetron "Von Ardenne" | PT01 | Thin film deposition | Tomas Nyberg | D | Von Ardenne | CS 730S |
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View
| Sputter - magnetron ZnO/CZTS | PT16 | Thin film deposition | Jonathan Scragg | B | Von Ardenne | CS 600 |
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View
| Sputter - table-top | PT22 | Thin film deposition | Tomas Nyberg | B | Quorum | Q300TD plus |
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View
| Sputter Coater - Au/Pd | AP16 | Sample preparation | Amit Patel | B | Polaron | SC7640 |
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View
| Sputter-RTA platform (BERTHA) | PT20 | Thin film deposition | Jonathan Scragg | C | - | - |
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View
| Stereo Microscope | PM25 | Metrology | Örjan Vallin | A | Nikon | C-LEDS |
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View
| Stylus Profiler "Dektak 150" | PM22 | Metrology | Tomas Nyberg | A | Bruker / Veeco | Dektak 150 |
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View
| Stylus Profiler "DektakXT" | PM32 | Metrology | Tomas Nyberg | A | Dektak | XT |
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View
| Sulfoselenisation Furnace (SuSe) | PD20 | Thermal process | Jonathan Scragg | B | --- | --- |
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View
| TCO sputter | PT18 | Thin film deposition | Tomas Kubart | D | von Ardenne | CS730 |
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View
| TEM/EDS - Titan | AT18 | Transmission electron microscopy (TEM) | Fredric Ericson | D | FEI | Titan Themis 200 |
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View
| UHV-PVD | PT24 | Thin film deposition | Rimantas Brucas | D | Prevac | N/A |
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View
| Ultrasonic Cleaner | AT12 | Transmission electron microscopy (TEM) | Amit Patel | A | Sonorex | --- |
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View
| Ultrasonic Cleaner | AP33 | Sample preparation | Amit Patel | A | Branson | 5510 |
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View
| Ultrasonic Cleaner | AP28 | Sample preparation | Amit Patel | A | Metason | 50 |
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View
| Ultrasonic Disc Cutter | AT04 | Transmission electron microscopy (TEM) | Amit Patel | A | Gatan | 601 |
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View
| UV Exposure | PB11 | Backend process | Hugo Nguyen | A | Bungard | Hellas-E |
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View
| Vac. / Vap. Prime Furnace | PL14 | Lithography | Rimantas Brucas | B | Star | 2000 |
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View
| Vacuum Leak Tester | PO01 | Other processes | Björn Kuzavas | A | Adixen | ASM 142 |
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View
| Vacuum storage (large) | PO03 | Other processes | Adam Hultqvist | A | - | - |
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View
| Vacuum storage (small) | PO04 | Other processes | Adam Hultqvist | A | - | - |
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View
| Vertical Furnace - LPCVD (poly-Si, a-Si) | PD08 | Thermal process | Örjan Vallin | C | Koyo Lindberg | Micro TF-6LP |
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View
| Vertical Furnace - LPCVD (Si3N4, SiNx) | PD09 | Thermal process | Örjan Vallin | C | Koyo Lindberg | Micro TF-6LP |
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View
| Vertical Furnace - LPCVD (TEOS oxide) | PD10 | Thermal process | Örjan Vallin | C | Koyo Lindberg | Micro TF-6LP |
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View
| Vertical Furnace (general purpose) | PD03 | Thermal process | Örjan Vallin | B | Koyo Lindberg | Micro TF-6 |
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View
| Vertical Furnace (high temp anneal) | PD05 | Thermal process | Örjan Vallin | B | Koyo Lindberg | Micro TF-6 |
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View
| Vertical Furnace (metal anneal) | PD07 | Thermal process | Örjan Vallin | B | Koyo Lindberg | Micro TF-6 |
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View
| Vertical Furnace (oxidation) | PD01 | Thermal process | Örjan Vallin | A | Koyo Lindberg | Micro TF-6 |
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View
| Vertical Furnace (oxidation) | PD02 | Thermal process | Örjan Vallin | A | Koyo Lindberg | Micro TF-6 |
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View
| Wet Bench - free acid / acid drain (KOH) | PC18 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench - acid | PL23 | Lithography | Rimantas Brucas | B | Stangl | --- |
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View
| Wet Bench - acid | PL24 | Lithography | Rimantas Brucas | B | Stangl | --- |
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View
| Wet Bench - acid drain, spin dryer | PC22 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench - Megasonic cleaning | PC10 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench - solvent cleaning | PL27 | Lithography | Rimantas Brucas | A | Stangl | - |
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View
| Wet Bench - Ultrasonic cleaning | PC11 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench - Water rinse | PL26 | Lithography | Rimantas Brucas | B | Stangl | - |
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View
| Wet Bench - work desk | PL25 | Lithography | Rimantas Brucas | B | Stangl | --- |
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View
| Wet Bench (KOH / HF) | PC19 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench (KOH-IPA / HF / warm rinse) | PC20 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench (RCA1 / RCA2 / HF) | PC03 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench (RCA1 / RCA2 / HF) | PC04 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench / E-beam resist development | PL22 | Lithography | Örjan Vallin | B | Stangl | --- |
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View
| Wet Bench / E-beam resist hot-plate | PL21 | Lithography | Örjan Vallin | B | Stangl | --- |
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View
| Wet Bench / E-beam resist spinner | PL20 | Lithography | Örjan Vallin | B | Stangl / Polos | SPIN 150i |
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View
| Wet Bench Acid surface treatments | PC02 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Etch and strip | PC01 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Metal etching | PC09 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Oxide etching | PC07 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Piranha | PC08 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Resist lift-off | PC06 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Bench Solvent clean | PC05 | Wet process & preparation | Sven Norén | B | Stangl | --- |
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View
| Wet Grinder | AP05 | Sample preparation | Amit Patel | B | Buehler | Metaserv |
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View
| Wire Bonder - ball | PB19 | Backend process | Rimantas Brucas | B | Kulicke & Soffa | 4524A Digital |
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View
| Wire Bonder - ball | PB02 | Backend process | Rimantas Brucas | B | Kulicke & Soffa | 4522 |
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View
| Wire Bonder - wedge | PB03 | Backend process | Rimantas Brucas | B | Kulicke & Soffa | 4526 |
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View
| X-Ray Inspection Station | PM26 | Metrology | Björn Kuzavas | B | Nikon | XT V 130 |
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View
| XRF | AX03 | Chemical analysis | Tobias Törndahl | B | Panalytical | Epsilon 5 |