Basic Information / Capabilites
Zeiss LEO 1550 is a high resolution FEG SEM for surface imaging equipped with an EDS system for element analysis.
Technical Specification
- Schottky FEG with high current mode.
- Acceleration voltage range: 0.2 – 30 kV, Beam deceleration providing excellent low kV imaging.
- 5-axis motorized stage (x, y, z, tilt and rotation)
- Detectors for secondary and backscattered electron imaging.(InLens SE detector, Everhar-Thornley SE/BSE detector and Four-Quadrant BSE detector)
- EDS: 80mm2 Silicon Drift Detector with high sensitivity and for analysis at high count rates
- 8.5 mm analytical working distance
- Oxford AZtec (INCA energy) software for X-ray mapping and element analysis
Performace
- Resolution: 1nm at 20kV, 3nm at 1kV
- Magnification: 20-900000x
Restrictions
- Sample size restrisctions: Max 200mm wafer.
- The samples must be compatible with high vacuum.
- Outgassing samples must be pre-pumped in a separate pumping system.
- Powder samples must me prepared with care to avoid contamination of the gun column.