| Warning | Wet Bench Etch and strip | PC01 | Wet process & preparation | Bath A, nitride etch, out of order. |
| Warning | Wet Bench (KOH / HF) | PC19 | Wet process & preparation | Circulation pump not working. |
| Warning | RTP | PD15 | Thermal process | No process above 500C is allowed. |
| Warning | ICP-RIE (Si-DRIE) "Tegal" | PE07 | Dry etch | Load lock transfer valve need special trick to be opened. Ask if you don't know that trick! Spare part due Dec 5th |
| Warning | Optical Microscope | PM17 | Metrology | The scale is incorrect (for all objectives). Not possible to do measurments. |
| Warning | FIB/SEM - Crossbeam | AF02 | Focused ion beam (FIB) | SEM working as intended.
Focus ion beam is still down.
Coming w.48-49:
- Plasma cleaning of the Ion column
- (if needed) replacement of the condenser unit!
- (if needed) replacement of the entire ion column!!
Regards,
Olivier |
| Warning | Sputter - magnetron "Von Ardenne" | PT01 | Thin film deposition | The power switch is permanently on for now. It is possible to run all programs but an error message will show up after each program (Device reports ON but should report OFF). Acknowledge the error, it causes no problems. |
| Warning | Evaporator - cryo (restricted use) | PT08 | Thin film deposition | Double-check recipes before deposition. Contact Henry if there is a doubt.
|
| Down | Vertical Furnace - LPCVD (TEOS oxide) | PD10 | Thermal process | Pumps on poly-Si PD08.
Vacuum pump oil levels need to be checked before every run. Contact MSL prior to run. |
| Down | Spin-Spray Coater | PL31 | Lithography | PC problems. |
| Down | ICP-RIE (Si-DRIE / aluminum etch) | PE01 | Dry etch | Short circuit in DC. Repair efforts Tuesday Nov 18. |
| Down | Plasmastripper "Upper" | PE04 | Dry etch | Can only be run in manual mode. See instruction at machine. Only as spare, should PE12 die. |
| Down | SEM/EDS - 1530 | AS06 | Scanning electron Microscopy (SEM) | Due to malfunctioning of a power supply circuit board (-24V) the SEM 1530 is down. |
| Available | Diamond polishing | AT17 | Transmission electron microscopy (TEM) | |
| Available | Fume Hood – KCN | PC51 | Wet process & preparation | |
| Available | Glass substrate cleaner | PC52 | Wet process & preparation | |
| Available | TEM/EDS - Titan | AT18 | Transmission electron microscopy (TEM) | |
| Available | ESCA II | AX02 | Chemical analysis | |
| Available | Ion Beam Etcher | PE10 | Dry etch | |
| Available | ALD - inSE | PT21 | Thin film deposition | |
| Available | 3D Optical Profiler ZYGO | AU07 | Surface analysis | |
| Available | Optical microscope | PL39 | Lithography | |
| Available | Ion Beam Etcher | PE11 | Dry etch | |
| Available | TCO sputter | PT18 | Thin film deposition | |
| Available | XRF | AX03 | Chemical analysis | |
| Available | GDOES | AX04 | Chemical analysis | |
| Available | Spectroscopic ellipsometer | PM33 | Metrology | |
| Available | PCB plotter | PB18 | Backend process | |
| Available | PL / EL Quantum Yield | PM34 | Metrology | |
| Available | IR camera | PM18 | Metrology | |
| Available | Balance | PM19 | Metrology | |
| Available | Balance | PM20 | Metrology | |
| Available | Saw - low speed | AP01 | Sample preparation | |
| Available | Saw | AP02 | Sample preparation | |
| Available | Embedder | AP03 | Sample preparation | |
| Available | Wet Grinder | AP05 | Sample preparation | |
| Available | Polisher | AP06 | Sample preparation | |
| Available | Polisher | AP07 | Sample preparation | |
| Available | Sputter Coater - Au/Pd | AP16 | Sample preparation | |
| Available | Evaporator (C) | AP17 | Sample preparation | |
| Available | Ultrasonic Cleaner | AP28 | Sample preparation | |
| Available | Hot Plate | AP31 | Sample preparation | |
| Available | Balance | AP32 | Sample preparation | |
| Available | LOM - Olympus - Optical Microscope | AU03 | Surface analysis | |
| Available | AFM - PSIA XE150 | AU04 | Surface analysis | |
| Available | SEM/EDS - 1550 | AS02 | Scanning electron Microscopy (SEM) | |
| Available | Ultrasonic Disc Cutter | AT04 | Transmission electron microscopy (TEM) | |
| Available | Polisher | AT05 | Transmission electron microscopy (TEM) | |
| Available | Dimple Grinder | AT07 | Transmission electron microscopy (TEM) | |
| Available | Ion Mill PIPS | AT08 | Transmission electron microscopy (TEM) | |
| Available | Plasma Cleaner | AT09 | Transmission electron microscopy (TEM) | |
| Available | Ultrasonic Cleaner | AT12 | Transmission electron microscopy (TEM) | |
| Available | Hot Plate | AT13 | Transmission electron microscopy (TEM) | |
| Available | Four Point Probe - automatic | PM21 | Metrology | |
| Available | Vertical Furnace (high temp anneal) | PD05 | Thermal process | |
| Available | Dicing Saw | PB01 | Backend process | |
| Available | Wire Bonder - ball | PB02 | Backend process | |
| Available | Wire Bonder - wedge | PB03 | Backend process | |
| Available | Evaporator - TMP (general use) | PT07 | Thin film deposition | |
| Available | RIE (SiO / SiN) | PE06 | Dry etch | |
| Available | Optical Microscope | PM01 | Metrology | |
| Available | Optical Microscope | PM02 | Metrology | |
| Available | Optical Microscope | PM03 | Metrology | |
| Available | Ellipsometer "Rudolph" | PM12 | Metrology | |
| Available | Wire Bonder - ball | PB19 | Backend process | |
| Available | Plating Station - pulse (Cu) | PC42 | Wet process & preparation | |
| Available | Stylus Profiler "Dektak 150" | PM22 | Metrology | |
| Available | Sputter - table-top | PT22 | Thin film deposition | |
| Available | Four Point Probe | PM35 | Metrology | |
| Available | Plasmastripper "New Lower" | PE12 | Dry etch | |
| Available | LOM - Leica DVM6 - Optical Microscope | AU08 | Surface analysis | |
| Available | Spin-Rinse-Dryer | PC53 | Wet process & preparation | |
| Available | 2-photon printer | PA01 | Additive manufacturing | |
| Available | Sputter - DC / RF | PT23 | Thin film deposition | |
| Available | Ion mill PIPS | AT19 | Transmission electron microscopy (TEM) | |
| Available | Extruder | PA03 | Additive manufacturing | |
| Available | EBL (e-beam litho) - JEOL | PL40 | Lithography | |
| Available | UHV-MET | PT24A | Thin film deposition | |
| Available | Beamer computer | PL41 | Lithography | |
| Available | Multi-capabilities 3D printer | PA02 | Additive manufacturing | |
| Available | UHV-OXY | PT24B | Thin film deposition | |
| Available | UHV-PLD | PT24C | Thin film deposition | |
| Available | XRD | PM36 | Metrology | |
| Available | MSLA printer | PA04 | Additive manufacturing | |
| Available | Pick-&-Place (w. dispenser) | PB06 | Backend process | |
| Available | Screen Printer | PB07 | Backend process | |
| Available | Hydraulic Press (w. heater) | PB08 | Backend process | |
| Available | Solder Furnace | PB09 | Backend process | |
| Available | Resist Laminator | PB10 | Backend process | |
| Available | UV Exposure | PB11 | Backend process | |
| Available | Resist Furnace | PB12 | Backend process | |
| Available | Dip Coater | PC44 | Wet process & preparation | |
| Available | Spray Etcher | PC45 | Wet process & preparation | |
| Available | Parylene Coater | PD16 | Thermal process | |
| Available | HT Furnace - atm | PD17 | Thermal process | |
| Available | Plasma Etcher | PE08 | Dry etch | |
| Available | Measuring Microscope with Digital Readout | PM24 | Metrology | |
| Available | Stereo Microscope | PM25 | Metrology | |
| Available | X-Ray Inspection Station | PM26 | Metrology | |
| Available | Resist Furnace (90 C) | PL15 | Lithography | |
| Available | Optical Microscope | PL35 | Metrology | |
| Available | Ultrasonic Cleaner | AP33 | Sample preparation | |
| Available | Furnace | AT15 | Transmission electron microscopy (TEM) | |
| Available | Polisher | AT16 | Transmission electron microscopy (TEM) | |
| Available | Sputter - magnetron "Lesker" | PT09 | Thin film deposition | |
| Available | CIGS evaporator - BAK | PT10 | Thin film deposition | |
| Available | Evaporator - UMS | PT11 | Thin film deposition | |
| Available | Spin-Rinse-Dryer | PC47 | Wet process & preparation | |
| Available | Mo sputter - MRC II | PT13 | Thin film deposition | |
| Available | Scriber | PB14 | Backend process | |
| Available | E-beam/resisitive evaporator - BA | PT14 | Thin film deposition | |
| Available | Fume Hood - CBD | PC48 | Wet process & preparation | |
| Available | ALD - F120 | PT15 | Thin film deposition | |
| Available | Sulfoselenisation Furnace (SuSe) | PD20 | Thermal process | |
| Available | Sputter - magnetron ZnO/CZTS | PT16 | Thin film deposition | |
| Available | Laminator | PB15 | Backend process | |
| Available | Image Reversal / Vapor Prime Furnace | PL36 | Lithography | |
| Available | ALD | PT17 | Thin film deposition | |
| Available | SEM/EDS/EBSD - Merlin | AS05 | Scanning electron Microscopy (SEM) | |
| Available | Nanoindenter | AU06 | Surface analysis | |
| Available | Vacuum Leak Tester | PO01 | Other processes | |
| Available | Fume hood – solvents | FC06 | Wet process & preparation | |
| Available | Fume hood – acids | FC09 | Wet process & preparation | |
| Available | EBL (e-beam litho) - NBL | PL37 | Lithography | |
| Available | Resist spinner | PL38 | Lithography | |
| Available | Spectroscopic reflectometer "K-MAC" | PM31 | Metrology | |
| Available | Ion Polisher Ilion | AP34 | Sample preparation | |
| Available | Stylus Profiler "DektakXT" | PM32 | Metrology | |
| Available | Vacuum storage (large) | PO03 | Other processes | |
| Available | Vacuum storage (small) | PO04 | Other processes | |
| Available | ALD - MP3 | PT19 | Thin film deposition | |
| Available | Sputter-RTA platform (BERTHA) | PT20 | Thin film deposition | |
| Available | Resist Laminator | PB16 | Backend process | |
| Available | Wet Bench - solvent cleaning | PL27 | Lithography | |
| Available | Mask Aligner - front / back side align | PL03 | Lithography | |
| Available | Spin Coater | PL08 | Lithography | |
| Available | Spin Coater | PL10 | Lithography | |
| Available | Hot Plate | PL11 | Lithography | |
| Available | Hot Plate | PL12 | Lithography | |
| Available | Hot Plate | PL13 | Lithography | |
| Available | Vac. / Vap. Prime Furnace | PL14 | Lithography | |
| Available | Resist Furnace | PL18 | Lithography | |
| Available | Wet Bench / E-beam resist spinner | PL20 | Lithography | |
| Available | Wet Bench / E-beam resist hot-plate | PL21 | Lithography | |
| Available | Wet Bench / E-beam resist development | PL22 | Lithography | |
| Available | Wet Bench - acid | PL23 | Lithography | |
| Available | Wet Bench - acid | PL24 | Lithography | |
| Available | Wet Bench - work desk | PL25 | Lithography | |
| Available | Wet Bench - Water rinse | PL26 | Lithography | |
| Available | Resist Furnace (110 C) | PL16 | Lithography | |
| Available | Nanoimprinter | PL30 | Lithography | |
| Available | Wet Bench (KOH-IPA / HF / warm rinse) | PC20 | Wet process & preparation | |
| Available | Wet Bench - acid drain, spin dryer | PC22 | Wet process & preparation | |
| Available | Wet Bench (acids at RT) | PC28 | Wet process & preparation | |
| Available | Vertical Furnace (oxidation) | PD01 | Thermal process | |
| Available | Vertical Furnace (oxidation) | PD02 | Thermal process | |
| Available | Vertical Furnace (general purpose) | PD03 | Thermal process | |
| Available | Vertical Furnace (metal anneal) | PD07 | Thermal process | |
| Available | Vertical Furnace - LPCVD (poly-Si, a-Si) | PD08 | Thermal process | |
| Available | Vertical Furnace - LPCVD (Si3N4, SiNx) | PD09 | Thermal process | |
| Available | Wet Bench Acid surface treatments | PC02 | Wet process & preparation | |
| Available | Wet Bench (RCA1 / RCA2 / HF) | PC03 | Wet process & preparation | |
| Available | Wet Bench (RCA1 / RCA2 / HF) | PC04 | Wet process & preparation | |
| Available | Wet Bench Solvent clean | PC05 | Wet process & preparation | |
| Available | Wet Bench Resist lift-off | PC06 | Wet process & preparation | |
| Available | Wet Bench Oxide etching | PC07 | Wet process & preparation | |
| Available | Wet Bench Piranha | PC08 | Wet process & preparation | |
| Available | Wet Bench Metal etching | PC09 | Wet process & preparation | |
| Available | Wet Bench - Megasonic cleaning | PC10 | Wet process & preparation | |
| Available | Wet Bench - Ultrasonic cleaning | PC11 | Wet process & preparation | |
| Available | PC12 - wet bench - Stangl | PC12 | Wet process & preparation | |
| Available | Wet Bench - free acid / acid drain (KOH) | PC18 | Wet process & preparation | |