Picture of ALD - F120
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AVAILABLE
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Atomic layer deposition of metal oxides and sulfides (M = Zn, Sn, In, Ga, Al, Mg).

Max substrate size 5x5 cm2.

Tool name:
ALD - F120
Area/room:
3R07 - FTE PV
Category:
Thin film deposition
Manufacturer:
Microchemistry
Model:
F120
Max booking time, day:
55 hours
Max booking time, night:
65 hours
No. of future bookings:
2

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