Picture of Vertical Furnace - LPCVD (TEOS oxide)
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Responsibles
1st Responsible:
Örjan Vallin
2nd Responsible:
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Description

LPCVD: SiO2 (TEOS) Tset + gasflow

Gases: Tetraethyl orthosilicate (TEOS, Fig. 1) from liquid, N2 (GA012),  O2 (GA051), PH3 20% in SiH4 (GA210), B2H6 1% in N2.

Figure 1. The TEOS molecule.

Details
Tool name:
Vertical Furnace - LPCVD (TEOS oxide)
Area/room:
3R76o - diffusion (HT-proc)
Category:
Thermal process
Manufacturer:
Koyo Lindberg
Model:
Micro TF-6LP
Process info

Recipe 1 deposits at 9 nm/min.

Settings for Pirani pressure gauges, in Torr:

3VS SP1=5.0, SP2=2.2·10-1, SP3=2.0

4VS SP1=10, SP2=5.0, SP3=NA

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