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FIB/SEM - Crossbeam (AF02)
Current status:
WARNING
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Responsibles
1st Responsible:
Olivier Donzel-Gargand
2nd Responsible:
Amit Patel
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Description
Technical Specification
Electron Column (SEM)
Gemini II SEM column with high-resolution Schottky FEG source.
Acceleration voltage:
0.2–30 kV
, optimized low-kV performance for high-contrast imaging.
Ion Column (FIB)
Ion-Sculptor Ga-LMIS
FIB column (0.5–30 kV).
Beam currents from
1 pA to 100 nA
for precision milling and fast material removal.
Column geometry:
54°
angle between SEM and FIB.
Stage
6-axis
super-eucentric
motorized stage (X, Y, Z, M, Tilt, Rotation).
Large travel ranges (e.g., X/Y up to 100 mm).
Detectors
InLens SE detector
InLens ESB (energy-selective backscatter) detector
Everhart-Thornley SE detector
Retractable BSE detector (BSD4 style depending on configuration)
STEM-in-SEM / aSTEM modes (institution-dependent)
Analytical Tools
Oxford EDS systems
Ultim Max 100 SDD
Gas Injection System (GIS)
Pt, W, Carbon,XeF2, Water GIS standard.
Software
Zeiss Atlas 5
for 2D large-area mapping, 3D tomography, and correlative workflows.
SmartSEM for SEM operation
SmartFIB for FIB operation
Performance
SEM resolution:
<5 nm
features resolvable at optimal kV.
High-quality low-kV imaging due to Gemini optics and ESB detector.
High-throughput FIB milling with
up to 40% faster
processing using intelligent scanning strategies.
Restrictions
High-vacuum only
SEM chamber; samples must be vacuum-compatible.
Outgassing or wet samples require pre-treatment
Stage travel supports
100 mm-class samples
; very large wafers may not be fully compatible for the Load loack
Powder and loose materials must be prepared carefully to avoid FIB/SEM contamination. (N2 blowing before insertion)
Details
Tool name:
FIB/SEM - Crossbeam
Area/room:
3R62 - SEM / FIB
Category:
Focused ion beam (FIB)
Manufacturer:
Zeiss
Model:
Zeiss Crossbeam 550
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