Picture of FIB/SEM - Crossbeam
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Technical Specification

Electron Column (SEM)

  • Gemini II SEM column with high-resolution Schottky FEG source.
  • Acceleration voltage: 0.2–30 kV, optimized low-kV performance for high-contrast imaging.

Ion Column (FIB)

  • Ion-Sculptor Ga-LMIS FIB column (0.5–30 kV).
  • Beam currents from 1 pA to 100 nA for precision milling and fast material removal.
  • Column geometry: 54° angle between SEM and FIB.

Stage

  • 6-axis super-eucentric motorized stage (X, Y, Z, M, Tilt, Rotation).
  • Large travel ranges (e.g., X/Y up to 100 mm).

Detectors

  • InLens SE detector
  • InLens ESB (energy-selective backscatter) detector
  • Everhart-Thornley SE detector
  • Retractable BSE detector (BSD4 style depending on configuration)
  • STEM-in-SEM / aSTEM modes (institution-dependent)

Analytical Tools

  • Oxford EDS systems Ultim Max 100 SDD

Gas Injection System (GIS)

  • Pt, W, Carbon,XeF2, Water GIS standard.

Software

  • Zeiss Atlas 5 for 2D large-area mapping, 3D tomography, and correlative workflows.
  • SmartSEM for SEM operation
  • SmartFIB for FIB operation

Performance

  • SEM resolution: <5 nm features resolvable at optimal kV.
  • High-quality low-kV imaging due to Gemini optics and ESB detector.
  • High-throughput FIB milling with up to 40% faster processing using intelligent scanning strategies.

Restrictions

  • High-vacuum only SEM chamber; samples must be vacuum-compatible.
  • Outgassing or wet samples require pre-treatment 
  • Stage travel supports 100 mm-class samples; very large wafers may not be fully compatible for the Load loack
  • Powder and loose materials must be prepared carefully to avoid FIB/SEM contamination. (N2 blowing before insertion)
Tool name:
FIB/SEM - Crossbeam
Area/room:
3R62 - SEM / FIB
Category:
Focused ion beam (FIB)
Manufacturer:
Zeiss
Model:
Zeiss Crossbeam 550

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