Picture of Plasma Etcher
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
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Gaser - Media inkopplade till TorrEtsen PE-100
G1 - Oxygen.
G2 - Argon.
G3 - Trifluormethane CHF3.

G4 - GA010 Nitrogen N2B.
N2 - GA010 Nitrogen N2B.
Air - Tryckluft.
G5 - Not Conected.

Tool name:
Plasma Etcher
Area/room:
3R44 - Etch & Thin Film
Category:
Dry etch
Manufacturer:
Plasma Etch
Model:
PE-100
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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