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Spin-Rinse-Dryer for 100 mm and 150 mm wafer cassettes

User Instruction: Turn on N2 valve on the wall Turn on power Pre-rinse cassette with wafers in the wet bench Load casette Press start Unload cassette Put empty cassette back and turn off power and N2

Standard recipe for both 100 mm and 150 mm wafer casettes:

  1. Rinse with DI water, 200 rpm, 80 s
  2. Purge with N2 , 800 rpm, 10 s
  3. Dry step 1, 1800 rpm, 300 s, heating inner chamber walls
  4. Dry step 2, 500 rpm, 120 s

 

 

Tool name:
Spin-Rinse-Dryer
Area/room:
3R79 - våtkemi
Category:
Wet process & preparation
Manufacturer:
Semitool
Model:
870 with PSC102 controller

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