Technical description
Full equipment name: NanoBeam Ltd. nB5 electron beam lithography tool (EBL)

General purpose:
• Electron beam patterning

Technical data and restrictions:
• EBL tool running at 80 kV with beam currents 1 to 15 nA
• Standard substrate size: from chip and pieces up to 200 mm wafers
• Chucks for arbitrary shaped substrates, 150 mm wafer, 100 mm wafers, and 20x20 mm and 10x10 mm chip
• Can load six chucks for sequential writing

Patterning capabilities:
• File conversion of CAD patterns in DXF, GDSII to machine’s own format npf
• Job instructions in text file with special syntax