Picture of RIE (SiO / SiN)
Current status:
AVAILABLE
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Advanced Vacuum Vision 320

The Advanced Vacuum Vision 320 is a Reactive Ion Etching tool (RIE). It is primarily intended for etching silicon oxide and silicon nitride. The tool has a large substrate table with a lot of room, for 100 mm (4") and 150 mm (6") wafers.


We have several process recipes for silicon oxide and silicon nitride etching. 

 

Tool name:
RIE (SiO / SiN)
Area/room:
3R44 - Etch & Thin Film
Category:
Dry etch
Manufacturer:
Advanced Vacuum
Model:
Vision 320
Max booking time, day:
12 hours
Max booking time, night:
12 hours
No. of future bookings:
10

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