Basic Information / Capabilities
The STAR-200 is a vapour priming system using HMDS. HMDS (hexamethyldisilazane) treatment is a crucial lithography step that modifies wafer surfaces from hydrophilic to hydrophobic. By binding a trimethylsilyl monolayer to the surface, it dramatically improves photoresist adhesion and prevents pattern delamination or undercutting during subsequent developing processes.
Technical Specification
• Temperature up to 150 +/- 10 °C.
• Capacity of 10 cassettes of 100 mm wafers or 8 cassettes of 125mm or 150mm wafers. The inner shelf can be removed for use of 2 cassettes op to 300mm wafers.
Performance
• The duration of the entire process is 32 min.
Restrictions
• Only clean wafers, chips / small pieces are allowed.
Chemistry / Materials
• HMDS
Safety
• be aware that temperature of 150oC can cause a finger burn while taking casete out, use protective gloves.