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Magnetron sputtering system dedicated to transparent conducting oxides. ITO, ZnO and ZnO:Al targets installed.

Processes for ITO, AZO, and ZnO are available. See process details for more information.

 

Loading substrates: the carriers must be placed on the top-most positions in the transfer chamber! See process details for the available processes and also for instructions on loading/unloading.

 

Substrates: Substrate carriers 100mm in diameter, substrate diameter max 98 mm, max. 3 mm thick.

100mm Si wafers can be used without the carrier, other samples on the carrier.

Tool name:
TCO sputter
Area/room:
3R44 - Etch & Thin Film
Category:
Thin film deposition
Manufacturer:
von Ardenne
Model:
CS730
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

ITO

ITO.tec -a single deposition on a chosen carrier. Start by pressing ITO button.

1.2-1.6 sccm O2 recommended, 1.4sccm O2 gives about 250nm in 120s, sheet resistance about 30 Ohm/sq.

 

AZO

AZO.tec -a single deposition, it is possible to choose what substrate carrier will be used.

Recommended conditions: 0.4sccm O2, 300s gives about 190nm and 35 Ohm/sq.

 

ZnO:

ZnO.tec -0.6sccm O2 recommended, 137s for 80nm.

 

CIGS stack (ZnO+AZO)

0sccm O2 recommended, 137s for ZnO, 300s for AZO

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