Magnetron sputtering system dedicated to transparent conducting oxides. ITO, ZnO and ZnO:Al targets installed.
Processes for ITO, AZO, and ZnO are available. See process details for more information.
Loading substrates: the carriers must be placed on the top-most positions in the transfer chamber! See process details for the available processes and also for instructions on loading/unloading.
Substrates: Substrate carriers 100mm in diameter, substrate diameter max 98 mm, max. 3 mm thick.
100mm Si wafers can be used without the carrier, other samples on the carrier.