PT02 - Evaporator

The Edwards Auto 306 FL400 is a high vacuum evaporation system equipped with two positions for resistive evaporation and one e-beam unit with four positions. It is also equipped with a film thickness monitor, a lamp for substrate heating, and a rotating substrate holder. The system is pumped with a fore pump for pre-vacuum and a turbo molecular pump for low pressure operation.

The Edwards Auto 306 FL400 is configured to allow somewhat relaxed conditions in terms of purity, outgassing and contamination. In addition to silicon and other semiconductors, resist covered wafers and following substrate materials may be used:

•  polyimide (kapton)
•  PVDF
•  PTFE laminates
•  glass reinforced hydrocarbon / ceramic laminates
•  liquid crystal polymer (LCP)
•  viton (fluoroelastomeres)

Materials that are allowed to evaporate are Ag, Al, Au,Cr, Cu, Ni, Pd, Pt, Ti.

Use of any other substrate or evaporation materials which are not listed above, must be discussed with and approved by MSL.