Picture of Wet Bench / E-beam resist development
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Örjan Vallin
2nd Responsible:
Rimantas Brucas
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Description
Details
Tool name:
Wet Bench / E-beam resist development
Area/room:
3R81 - litografi
Category:
Lithography
Manufacturer:
Stangl
Model:
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