Picture of Vertical Furnace - LPCVD (poly-Si, a-Si)
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LPCVD: poly-Si Tset + gasflow

Gases: N2 (GA012), SiH4 (GA100), N2O

Tool name:
Vertical Furnace - LPCVD (poly-Si, a-Si)
Area/room:
3R76o - diffusion (HT-proc)
Category:
Thermal process
Manufacturer:
Koyo Lindberg
Model:
Micro TF-6LP

SiH4  →    Si  +    2 H2

The SiH4 cylinder is placed on the left in the leftmost container at the gable end of the clean room. 

The SiH4 has an pneumatic interlock in the visitor's corridor at the gable end of the clean room. This have to be re-activated after any power failure.

 

Settings for Pirani pressure gauges, in Torr:

3VS SP1=5.0, SP2=2.2·10-1, SP3=2.0

4VS SP1=10, SP2=5.0, SP3=NA

 

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