Picture of TCO sputter
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Tomas Kubart
2nd Responsible:
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Description

Magnetron sputtering system dedicated to transparent conducting oxides. ITO, ZnO and ZnO:Al targets installed.

 

Automatic processes for ITO, AZO, and ZnO are available. Up to 4 wafers can be deposited in a single batch. See process details for recommended conditions.

 

Substrates: Substrate carriers for substrates up to 150 mm in diameter, max. 3 mm thick.

Details
Tool name:
TCO sputter
Area/room:
3R44 - ets / tunnfilm
Category:
Thin film deposition
Manufacturer:
von Ardenne
Model:
CS730
Process info

ITO

ITO.tec Start by pressing ITO button.

1.2-1.6 sccm O2 recommended. 1.2sccm O2 gives about 250nm in 120s, sheet resistance about 30 Ohm/sq.

 

AZO

AZO.tec  Start by pressing AZO button

Recommended conditions: 0.4sccm O2, 600s gives about 200nm and 35 Ohm/sq (when the AZO target was moved to another posiiton, deposition rate dropped to about 50%, therefore, the deposition time is longer than before).

Conditioning may be necessary after a longer time when the process was not in use. 2x10 min seems to be enough, there is a program AZO_conditioning.tec that can be used (dummy deposition, no need to load substrates). 

 

ZnO: not installed

 

Wicon

Renaming a substrate, example A1 position in the transfer chamber

A1_2TC.NAME="A1"

Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
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