System intended for image reversal of positive resist using ammonia and vapour priming with HMDS.

Temperature:  Up to 150 +/- 1 °C (typically 90 °C for image reversal and 150 °C for vapour prime).

Capacity:  12 cassettes of 100 mm wafers or 8 cassettes of 125mm or 150mm wafers. The inner shelf can be removed for use of 2 cassettes op to 300mm wafers.

Process duration:  Typically 1h 30 min for image reversal and 30 min for vapour prime.