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PT05 - Table top sputter


The K675XD is a table sputter from Emitech that employs Dual magnetron target assemblies and uses low voltages to enhance the efficiency of the process and give a fine grain, cool sputtering.

An integral shutter and stage assembly allows a sputter cleaning and the sputter coating cycle to be carried out sequentially while maintaining the vacuum. It features a rotating sample table / shutter support arm for even depositions and a turbo-molecular pump backed by a rotary vacuum pump. The system is fitted with two 54mm diameter quick-change targets and a film thickness monitor (FTM). Substrates of up to 150mm in diameter can be used for coating. In this equipment Ar is used as plasma gas.

Standard sputtering materials that are available from MSL are as follows:  Ag, Al, Au, Cr, Cu, Ni and Ti.

Use of a new material, for which a target is not available from MSL, must be discussed with and approved by MSL.

Tool name:
Sputter - table-top
Area/room:
3R76v - RTP / PVD / ets
Category:
Thin film deposition
Manufacturer:
Emitech
Model:
-

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